German silicon photograph voltaic wafer manufacturing agency NexWafe launched it has established a U.S. subsidiary to evaluate the occasion of a multi-gigawatt-scale photograph voltaic wafer manufacturing facility within the US with a purpose annual manufacturing amount of 6 GW. This potential U.S. operation would leverage NexWafe’s EpiNex manufacturing experience that is being put in place on the agency’s under-construction 250-MW facility in Bitterfeld, Germany.
NexWafe has appointed Jonathan Pickering, former president of JA Photograph voltaic Americas, as VP of enterprise enchancment for North America to spearhead the U.S. operations search. The company is actively engaged in securing strategic partnerships, assessing potential manufacturing areas and the associated regional incentives, and securing offtake agreements for residence wafer present.
“A number of top-tier photograph voltaic firms have devoted to superior PV cell and module manufacturing at a multi-gigawatt scale all through the U.S. Nevertheless now we see an enormous bottleneck throughout the present chain for a house provide of silicon wafers,” Pickering acknowledged. “Our breakthrough EpiNex direct ‘gas-to-wafer’ manufacturing course targets this exact different. We’re rising a gigawatt-scale facility to manufacture high-performance, American-made, skinny silicon wafers to serve our U.S. prospects, and we are going to obtain this by attaining a 60% low cost throughout the carbon footprint as compared with as we converse experience.”
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